Hello, I have the following wafer structure: Si wafer + Hafnium Oxide (Hafnia) layer + lithographically deposited gold waveguides with chromium as an adhesion layer (0.5 nm). Waveguides are 20 nm thickness. I need to clean the wafer down to HfO2 layer. Would Aqua Regia damage/remove HfO2 layer? Also, is there any other ways to strip off the Au without damaging Hafnia?
Thank you,
Alex
Carlos Araújo Queiroz
You could consider hot (approx. 70 ºC) solution of potassium iodide (40 g) and iodine (20 g) in 100 ml of water (tri-iodide etchant) for etching the gold, what could be followed by some suitable chromium etchant (without HF); cf. (e.g.): http://www.microchemicals.eu/technical_information/chromium_etching.pdf
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