Hello, I have the following wafer structure: Si wafer + Hafnium Oxide (Hafnia) layer + lithographically deposited gold waveguides with chromium as an adhesion layer (0.5 nm). Waveguides are 20 nm thickness. I need to clean the wafer down to HfO2 layer. Would Aqua Regia damage/remove HfO2 layer? Also, is there any other ways to strip off the Au without damaging Hafnia?

Thank you,

Alex

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