Hello,
Due to my research, I want to release a patterned photoresist mold (for PDMS molding) from a Si-wafer. Unfortunatly, the photoresist is highly senstive to organic solvents.
During my research, I found that PVA (Polyvinyl alcohol) can be used for a water-based photoresist film release. Does anyone have a recipe for a PVA-film application for a sacrificial layer?
Mohammadhossein Dabaghi
Hi Karl,
Take a look at this paper:
Poly(vinyl alcohol) as a structure release layer for the microfabrication of polymer composite structures.
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Hisay Lama
Yes. PVA indeed can be used as a sacrificial layer since its water soluble. Have a look into a paper_
https://arxiv.org/pdf/1605.05915.pdf
Here they have used PDMS free standing membrane by using PVA as a sacrificial layer.
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