DC reactive magnetron co-sputtering technique can be successfully used to prepare a multilayer structure of a metal nitride layer on a metal oxide layer. Such multilayer structure can sufficiently represent a nanocomposite material for many recent applications in photonics and photocatalysts. However, the process of preparation is not that easy because the conventional mode may require postprocessing, such as annealing and heat treatment, while preparation of this multilayer structure in one deposition course can produce highly-pure nanostructured composite material. The good news is that you sputter the same metallic target in presence of oxygen and nitrogen as reactive gases to form the oxide and the nitride of the same metal. The bad news is that you require to sputter two different metals to produce the nitride of one of them and at the same time the oxide of the other metal, as shown in the sketch. This is a challenge because the determination of the radii of both targets is not that simple. It needs precise modeling and simulation treatment.

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