Normally we believe Xe ions must be more detrimental to the specimen's surface compare to Ga ions, since they are heavier and larger.
So personally I would not consider PFIB method suitable for TEM lamella preparation.
But I heard somewhere that using PFIB (using Xe) the amorphous layer of the TEM lamella is even thinner compare to the normal FIB (using Ga)! Physically I can not digest this as a fact!
Any experience?