We have a MBE system equipped with RHEED. I am using GaAs wafer and heating substrate temp as high as 620C but not getting any patterns. though there is direct beam. what I have to do? can any one help me?
do you have the possibility to rotate the sample in-plane along 360°? Sometimes the angles where RHEED patterns can be seen are quite sharp.
Which orientation does your wafer have? Do you know how it is oriented with respect to the electron beam, i.e. in which angular orientation you can expect patterns?
How long did you heat the substrate?
What about the vacuum in your chamber, which order of magnitude do you reach?