I have learnt from the literature that SmNiO3 phase can be synthesized at high pressure (100bar of Oxygen pressure) and high temperature (770K) conditions. Though these conditions are very expansive and I am looking for an alternative rather simple route of SmNiO3 synthesis. Can you please suggest the possible method of synthesis. Literature is attached.
Hi Kapil,
I read the articles and it is clear this material needs high oxygen pressure for annealing to get single phased SmNiO3.
With magnetron sputtering, since it is non-thermodynamical process in nature, you might be able to get the right composition. The problem is the crystal orientation, as shown in fig 1, where you have an amorphouslayer after sputtering. This is normal for most sputtering processes. What you could try is to find a lattice matched substrate for the SmNiO3 and use that as material to grow the SmNiO3 on. It is known you can get epitaxial growth of films if this lattice match is ok, < 2-5%. In this way you maybe can avoid the anneal step at 100 bar and get a good crystal orientation & composition as deposited.
Just to prepare the SmNiO3 composition should not be such a big deal.
The easiest rout will be a Sol-Gel technique starting from the corresponding alkoxides.
This process will get you an amorphous material, which then most probably needs to undergo a calcination. Having the correct starting composition is just the first step in process.
Dear Prof Giesche
Thanks for the reply.
As reported by Prof Ramanathan group (literature attached) the SmNiO3 can only be formed under high pressure high temperature conditions, which makes it more difficult to synthesize. Can you comment on it? Is there any alternative way to synthesize under mild pressure/temperature conditions?
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