tinking of 3D printing with a special source based on MVP.
the MVP design could also be used as sputter source? when reaching a self-sputtering mode, this would be a perfect material source.
But of course needs to run in vacuum. (Plasma sheath or is there some sheath at atmo pressure? how big, enough for a travelling wave? if atmo, there is no different to plasma-spraying with DC or rf torches) Some 50 to 100 Pa in the source, and a vessel at contamination limit depending on deposition speed.
Kousaka-sensei can go to PECVD with 1mm/hour deposition (more polymer like then diamond-like probably, not so sure..)
But 1mm/hr Titanium coating locally as a 3D-printing plasma-source-head? Still too slow to compete?
just an idea..
lukas
busy with all but plasma technology.. sad to say.
greetings
Hi Lukas, yes, I would have thought the "curve" you are suggesting should exist and would be very useful. Sadly, all I can offer is a rough rule-of-thumb from my vacuum coating days during the 1990's of: a monolayer of contaminants forms every second at 1 x 10^-6mbar.
Good luck with your research.
Best regards,
Martin
Hi Lukas, I guess it would depend somewhat on the contaminants in the system and the material being deposited - ie the mutual "sticking" coefficient. Otherwise you could model it from first principles: At a given pressure there will be X amount of collisions with the surface being deposited, so in a given time interval there will have been Y "bonded" collisions for a total volume of deposit.
Yes , exactly.. but too lazy to fit this into octave or scipy.
starting pressure, deposition rate and sticking coeff. , what is the rate needed when starting at 100Pa base pressure. (chamber size, new parameter.. temperature (outgasing) next one..)
No Student without a task around?
Next step is then building the material source capable of delivering the needed rate. Of course it should run in self-sputtering mode..
also there there should be this kind of table.. which material/pressure/bias-current-density self sputtering occurs.. (Anders & Co.)
At the end one could find out if 3D plasma-sputter printing is viable or not? or one would need a kind of plasma-jet-cvd stuff. (which of course makes the equations more complex) (Bogaerts & Co)
Some are on this way.. (Lundin and friends..)
Would love to see Kousaka's MVP plasma running in self-sputtering mode.
Lukas
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