Recently I fabricated PEDOT:PSS resistor in which PEDOT:PSS is patterned through photolithography. I have a doubt that whether PEDOT:PSS dissolves in acetone at the time when I tried to remove PPR from my substrate?
It should not be soluable in acetone. I have used PEDOT:PSS , patterned using photlithography and removed the resist using acetone. But in my case I used to protect the pedot from being etched, hence the acetone had a short exposure to the pedot. Water had more adverse effects on the adhesion of the PEDOT:PSS though. Have a look at the following paper.
Article Development of a conducting polymer cell impedance sensor
No. Even in water it is not a proper solution - it is a suspension. The particles have nanometre dimensions, though.
It will never dissolve obviously but from a fabrication point of view , you can have adhesion problems which arise due to absorption of water and weakening of the binding between the substrate and the patterned layer.
Thanks for the answers.
But still when I try to remove PPR in acetone, PEDOT:PSS film starts to peel off. Moreover it is transparent and is difficult to see with the eye.
Though there are supporting references to PEDOT:PSS patterning, suggest me a good recipe to pattern PEDOT:PSS?
I think its important to know what kind of PEDOT:PSS you are using, the commercial ones usually have additives, perhaps that makes a difference in this case. Also what is your substrate? If it starts to peel off, that means its an adhesion problem more than any solubility issue. I used to use a grade from Agfa that had adhesion promoters which worked quite well on glass (which has notorious adhesion problems with conducting polymers). Given you have to put a resist on top, you are not left with much of a choice and have to use some solvent, so I would presume that adhesion problems will persist. All I can say is that perhaps instead of acetone, you could re-expose the resist and use the developer to remove the layer, unless you do a negative resist in which case this wont work.
Sure. Let me try out the recipe of yours.
I have been using PEDOT:PSS AI 4083 purchased from ossila
Do you know a photoinitiator to pattern PEDOT:PSS by photolithography?
@ Mohamed: No idea of what you are talking about. If you know, kindly explain me.
You can use ORTHOGONAL photoresist instead of normal photoresist. That helps to protect PEDOT:PSS while etching the photoresist. you do not need to expose the PEDOT:PSS with acetone. In my experience, PEDOT:PSS does not dissolve in acetone but the conductivity after exposure might be changed.
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