You can read explanation here (no relation to company):

http://www.jcnabity.com/

A further company specialized on such add-ons is Raith (https://www.raith.com/). (no relation to the company either). Basically spoken you need a beam blanker as additional hardware and a software to control/synchronize the SEM and the beam blanker for a simple system. If you want to produce larger lithography areas you can either use a larger write field which leads to less resolution or you need a stitching option with a laser interferometric stage control (expensive and not always easy to add)

Hi all,

indeed, you have Nano Pattern Generate System of J. Nabity (no relation to this company) that I used during my PhD and works very well. It was associated to a SEM Hitachi S3500N (no relation to this company) . The RAITH company (no relation to this company) has this type of system that I also used during a post-doc and that also works very well. Now, that depends on the system (SEM) that you have, writing fields that you want to do...

Best regards

Greg.

I too would go with the Nabity system. I am a long term user of this. Basically it's a pc board that generates the scan and software that creates the patterns and implements them, plus some cables and a couple of other small bits of hardware. Currently running it on an FEI machine. Strictly speaking you don't need a fast blanker with this system as you can set what are called dump points, although my machine does have a fast electrostatic blanker from scanservice. The dump point option will keep the cost down but might limit what you can do a little. I have used the Raith system a little also and I found it broadly comparable in performance but a bit more fiddly to get to grips with.

Cheers

David

The question is old, but wasn't completely answered IMHO. The direct answer would be "No, besides of software you would have to buy a pattern generation hardware." It is mainly a matter of SEM hardware designed for raster (line-by-line) scanning for the purposes of producing image. Lithography application requires vector (arbitrary direction with varied speed) scanning which typical SEM hardware can't provide. Of cause some rudimentary EBL with raster-only scanning is possible, but that would be rather conceptual demonstration of potential possibility than practically viable e-beam lithography.

The EBL is available on some TESCAN microscope, check www.tescan.com, even on some cheap ones.

It is possible you it is not only a matter of good software.

Have a look at the Xenos webpage here:

http://www.abeamtech.com/?dir=products/Xenos&pg=index