When monitoring the growth of films by MBE, we can determine the number of layers deposited by the oscillations in the RHEED intensity. Is this also the same with PLD? We cannot see the oscillations. We are using 1Hz. Is this frequency too low?
PLD deposition is normally done at very high pressures and that too in oxidizing atmosphere while depositing oxides.
MBE is done at very low levels of vacuum
Just check: probably RHEED requires low level vacuum as well.
K. Sreenivas
1) You can try depositing you film by PLD at whatever pressure you are depositing, and whcih ever material you ablating.
Stop the film deposition. Pump down your chamber and then try to use your RHEED apparatus to get your information from the substrate surface..
Now ablation with PLD without any gas at such a low pressure of 10-7 torr. Is that possible to use simultaneously the PLD deposition and RHEED. I have some doubts on this.
By the way what are you ablating (target material) using PLD, and at what pressure ?
K. Sreenivas
It is possible, we have just deposited FeSe on STO and we used the RHEED while we are depositing, we can see the RHEED pattern of the STO and its intensity decreases as we deposit FeSe. We want to see the oscillations in the RHEED intensity so that we can judge how many pulses is needed to deposit one unit cell. But the problem is, we cannot see these oscillations. (The target material is FeSe and the pressure is around 10^-7 torr. )
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