I sputtered a Ni-5.5Al (at%) target onto a glass substrate, suing DC magnetron. The thin film thickness is about 275nm.
The XRD on both sputtering target (bulk) and the thin film suggest that the grain orientation consists of AlNi (110) and Ni (200). However, I noticed that:
a) AlNi peak on the bulk is at 44.48°
b) AlNI peak on the thin film is at 43.38°
Attached is the XRD spectrum image.
Is the 1° different siginificant? Based on Bragg's law, this will show a difference in the lattice parameter. However, I am wondering if the result I am getting is negligible and if I only need to take note on bigger difference (e.g. more than 5°)?