Muhammad Reza

8 Questions 24 Answers 0 Followers

Questions related from Muhammad Reza

What is the function of "phase shift" in MW PECVD process?

While using MW PECVD to deposit SiNx on Si wafers, I came across the "phase shift" setting. Based on the manual, my understanding is that if I set the phase shift at 20%, the oscillation from the...

08 August 2016 4,726 2 View

Is a difference of 1 degree on XRD results between sputtered target and thin film significant?

I sputtered a Ni-5.5Al (at%) target onto a glass substrate, suing DC magnetron. The thin film thickness is about 275nm. The XRD on both sputtering target (bulk) and the thin film suggest that the...

11 November 2014 6,324 9 View

Is there a database available for mean-free-path (m.f.p) of particles in a vacuum?

Could any researchers provide links to a database of m.f.p of particles under vacuum conditions? I am trying to compare the m.f.p of Ni, Al and several other metals under vacuum in order to...

10 October 2014 8,293 7 View

What is the effect of grain size of sputtering targets towards formation of a particle (DC sputtering)?

Is there any correlation between the grain size of the sputtering targets towards the formation of the thin films? I came across a research by CA Michaluk (2000), stating that the rate of erosion...

10 October 2014 7,304 7 View

Can anyone explain why I am getting a correlation between NiAl particle size and Hc (coercivity) which goes against Dunlop (1981) and Herzer (1997)?

I sputtered NiAl targets using a DC sputtering equipment onto glass substrates to produce 2 thin film samples. Sample A : Particle size = 16 nm, Hc = 130 Oe Sample B : Particle size = 28 nm, Hc...

09 September 2014 1,880 6 View

What causes different grain orientation and composition between DC sputtered NiAl thin film and bulk?

I sputtered Ni-5.5Al (at%) targets onto a glass substrate, which was preheated to 250C before sputtering. Sputtering time is 60 minutes. The thickness of the thin film is about 510 nm. The...

09 September 2014 3,290 6 View

Is there any correlation between a thin film's porosity with hysteresis loop of Ni-5.5Al (at%) thin film?

I prepared several Ni-5.5Al thin films, then checked the magnetic properties using VSM. I expected that with increased sputtering time, the hysteresis loop would change proportionally; Ms will...

06 June 2014 9,727 8 View

How to explain the different magnetic properties between sputtering target (Ni20Al) and deposited thin film?

The sputtered target (Ni-20Al bulk) itself is non-magnetic, as confirmed by VSM. Using DC magnetron, NiAl atoms were sputtered on glass substrates. However the thin films (2 to 10 microns) showed...

05 May 2014 5,526 14 View