I know that this is a very difficult question, as the areas of application can vary greatly. However, if you want to operate low as well as high resolution (from a few millimeters to nanometers), need the highest possible beam current for analysis, but also very flexible with regard to large samples or non-conductive samples (low vacuum device), a whole series of devices or manufacturers fall out, as far as I know. If you don't want to constantly change pressure stage apertures, the only manufacturer I can think of at the moment is Zeiss.
FESEM with best in class detectors which may be (or will be) from different OEM (other than OEM of FESEM). For example - different companies specialize in EDS and EBSD subsystems/ detectors which will be fitted to the main FESEM system. Selection of brand of main system (FESEM) and of the attachments (detectors) is purely application context specific.
My experience: Tescan Mira fits all the requirements except for the easy switch to low vacuum (you need to put in a bullet). Other than that, high currents possible (
Tijmen Vermeij : you do not exactly know which type of FEI -SEM would be beneficial? I've heard, Mira4 shall be also able to switch between low and high vacuum?
Gert Nolze : I don't know the new FEI systems... Although we are also looking for a new SEM, and I think we are soon getting a presentation from them about their new systems; will let you know what I learn.
We have a Mira 3, didn't hear this about the Mira 4, but I can imagine they'd want to do that...
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