I know I can use VLS and CVD methods to grow them, but I need a faster/easier/cheaper way to do a thin layer uniform coating of silicon on carbon or Nickel. I'd like the thickness of the deposition to be less than 50nm. Can you help?
hi...please check the electrochemical series, if you find silicon there, than please see its redox potential...to make a film by electrodeposition you have to have ions in the solutions, and that has to reduce to the element...
Dillip could you expand on your line of thought please. I'd like to know more on this front.
Aneil...please check any standard electrochemistry book, where you can find an electrochemical series of metals, which can tell you that at what potential a metal can reduce or oxidise...please search for that series you will have your answer i think...
Concerning my experiences on this topic, I do not know a faster procedure.
Don't use the electrodeposition (it is strongly ambient-unfriendly), use instead Noivion IJD technique. The layer is at a laser deposition quality at the minimal fraction of cost only. Silicon on almost anything is "the bread for its teeth (italian saying "pane per i suoi denti" - somethink very well suited for that purpose).
www.noivion.com
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