For a protective mask I'd like to use positive photoresist S1813 or AZ5214E.
U can use tmah, it etches silicon with a faster etch rate.
TMAH 25% - use lower temperature in order to obtain better ER control.
Follow up question - is our sputtered Si amorphous, or polycrystalline?
One more thing - the resist as a masking material will not work in this case you would need to have an oxide mask in order to use TMAH
HNO3 (69%) : H2O : NH4F (40%):: 64% : 33% : 3% :: 189 ml : 96 ml : 7.5 ml
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