It is well known that a smooth substrate with step surface is important for growing epitaxial films. Recently, I encountered this problem on LaSrAlO4 and MgO substrates. I have tried H3PO4 etching for MgO, and NaOH etching for LaSrAlO4, accompanied with high temperature annealing. However, the treated surfaces are not satisfactory.

Can anyone tell me better methods to treat them?

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