Dear Rajagopalan Pandey , crosslinked SU-8 is not soluble and can only be removed mechanically or by means of dry etching techniques. Some people commented on this issue before in RG as you can see in the following link:
There a couple of additional solutions are provided, to use a swelling solvent that facilitates the SU-8 removal or substitute SU-8 by another photoresist from the same manufacturer.
May be is too late for your sample, but it could have been useful to add a thin layer below the SU-8, which should be easy to remove and therefore the SU-8. This layer could be a thin metal layer or some other polimer that withstands the SU-8 developer.
Coat the SU-8 with DCM. Then, you can peel off the PDMS from SU-8 and it will not stick to your photoresist. We did on much ticker SU-8 and it worked. You can read this paper for more details, and please let me know if you need more information: