I wanted to isolate some of my nanowires from its substrate.I have found that researchers use the sonication method but it was not very clear.Can some one give a clear methodology of how to isolate and store it ?
Sai, sonication using a low power sonicator and for a short time should remove some of the nanowires from the substrate. The process / efficiency of removal and storage depends on several factors, including what materials (nanowire) you are using, what sort of substrate you are using, how they are bound to the substrate and what solvent you plan to store in ----- the list goes on and on; Impossible to answer unless you give some more details.
Sai, sonication using a low power sonicator and for a short time should remove some of the nanowires from the substrate. The process / efficiency of removal and storage depends on several factors, including what materials (nanowire) you are using, what sort of substrate you are using, how they are bound to the substrate and what solvent you plan to store in ----- the list goes on and on; Impossible to answer unless you give some more details.
Besides sonication.. there are couple of other techniques to remove GaAs NWs..
Rather than removing NWs from Si substrate.. remove Si substrate by dipping it in BOE.. buffered oxide etchant....
Second is PMMA technique commonly used to transfer of graphene from metal foils.. details of which you can get from any graphene papers..
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