I want to remove some of my nano-wires from a substrate. I have read papers where researchers have used sonication methods for it but the method was not quite clear.Can anyone give a clear methodology for it?
Also how can it be stored once removed?
that depends for what uses you want to remove these nanowires. I have removed from silicon substrate by simple scratch method and used for TEM study. So I found few then It works for me. Please let me know your substrate and your end application. Because scratch method can also force substrate contribution which is not problem during TEM.
Mostly I use the scratching procedure proposed by M. Kumar, see above. Alternativewly, you can apply a droplet of e.g. water to the substrate with nanowires and then freeze the water. the NWs are likley to break of at the bottom. After this, you can disperse the NWs on the substrate of desire.
Marcel. I believe there is a possibility of reaction between a particular NW and water. This would change the characterization results and the NWs application.
As an alternative, see
"High yield transfer of ordered nanowire arrays into transparent flexible polymer films " by Anthony Standing
http://iopscience.iop.org/0957-4484/23/49/495305/
that is: transfer the nanowires into PDMS.
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