There are some sputtering conditions from other papers to grow crystalline Gallium oxide, such as heat substrate up to 500deg or insert Argon and oxygen flowing gas mixture. However, due to some problems related to chamber design, it can not work at high temperatures. Can you guys tell me is there any way to grow crystalline gallium oxide thin film?
Thank you for reading
Dear Lalisa,
many thanks for sharing this very interesting technical question on RG. There are a few potentially useful literature references available which I would like to suggest to you. Please have a look at the following relevant articles:
Review—RF Sputtered Films of Ga2O3
Article Review—RF Sputtered Films of Ga 2 O 3
Fortunately this article has been posted by the authors as public full text on RG. This means that you can freely download it as pdf file.
Gallium oxide films deposition by RF magnetron sputtering; a detailed analysis on the effects of deposition pressure and sputtering power and annealing
Article Gallium oxide films deposition by RF magnetron sputtering; a...
This paper has not yet been made available as public full text on RG. However, four of the authors have RG profiles. Thus it should be no problem to request the full text directly from one of the authors via RG.
Growth and characterization of gallium oxide thin films by radiofrequency magnetron sputtering
https://hal.archives-ouvertes.fr/hal-01204711/document
(please see attached pdf file)
I hope you will find this information useful. Good luck with your work and best wishes, Frank Edelmann
The substrate temperature is a very important parameter in the process of thin-film deposition. It provides favourable energy at the substrate surface atom on which the sputtered atom is to be deposited. Even the chamber design does not allow to heat substrate temperature, you can make your own design, by putting a small heater attached just backside of the substrate holder. The temperature can be controlled by variac and can be sensed by the thermocouple, let say K-type. I hope you have many vacuum ports attached to your main chamber, and the required number of electrical connections can be taken out from the main chamber to outside using cheap and robust electrical feedthrough. Your little effort can solve your problem and it will help you to deposit several different samples with substrate heating conditions. Good luck.
- Badges
- Science method
- Similar topics
- Methodology
- Crystallography
- X-ray Diffraction