19 March 2017 5 4K Report

大家好

器件製造

ITO-PEDOT:PSS(4000rpm)-EML(1000rpm)-Al(TE 80nm)

EML

CBP 10mg:甲苯1ml

CBP:Ir(ppy)4wt%

然而,我正在獲得流過製造的器件的非常高的電流。

EML膜也不那麼光滑。EML膜難以附著在腳趾上:pss。

使用PMMA添加甲苯。但效果與此一樣糟糕。

但是使用甲苯的濕法工藝的許多論文都是大約2000轉/分,並且是相當好的附件。不明白它們是如何做到的。

任何人都可以幫助我解決這些問題。

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I try another way.

ITO  -PEDOT:PSS(4000rpm)- EML(x rpm)- BCP(5nm for TE)- Lif(1nm for TE)-Al(for TE 80nm)

x-(500 1000 1500 2000 rpm)

From the previous simple experimental architecture to the recent attempt to complex architecture.

The components are gradually stabilized from previous measurements using IV measurements only to measure slashes and current is too large.

Now the components glow.

But all of the edge of the light, the location is quite uneven, and the need for light up to 25 (voltage) above the voltage.

I would like to try to add Alq3 after BCP to help electron injection.

By the way, I can change PEDOT: PSS to NPB 20nm (for te)?

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