15 August 2022 0 10K Report

Hi everyone,

I am doing Mechanical Exfoliation of MoS2 on SiO2/Si. The substrate has been ultrasonic cleaned by IPA and acetone for 10 mins. But I have problem on getting intact MoS2 flakes.

Everytime I do AFM measurement of the mechnical exfoliated MoS2, it looks like there are particles/blisters/tape residue ( I have no idea what it is) under or on the MoS2 flakes (the figure below). However, the AFM measurement results in published paper, their MoS2 flakes look intact and clean. Also, I got tape residue on SiO2/Si either which I neither seen on published paper.

I have tried Scotch tape, Nitto tape for exfoliation, fast and slow speed for tearing the tape, press the the tape on substrate for different time and tools or even ultrasonic by acetone and IPA after exfoliation but just can solve the problem.

I would like to know how can I get intact MoS2 flakes.

Your help is appreciated. Thanks a lot.

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