Had an array of silicon nanowires, now I want to deposit a metal particle on the top of it. I do not want to use the VLS method to get this. Anyone have any suggestion?
You can do it by sol-gel method and layer by layer dip-coating method.
I used this method to prepare of a thin layer film of nano-pin titania on the alumina surface (Current Nanoscience. 11/2010; 6(6):642-647).
You can try by electrodeposition. You'll need to control the localization by ajusting the metallic ion concentration in your solution. You can have a look at the paper: Journal of Porous Materials 7, 77–80 (2000) / DOI 10.1023/A:1009611225946
http://link.springer.com/content/pdf/10.1023%2FA%3A1009611225946
In this paper, the goal was to deposit at the bottom of a porous structure, but by adjusting the SI-doping and/or the concentration¤t of the electrodeposition you can most probably do it.
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