Dear Piyush,

if I well understood the problem, you want to use an MI band heater in order to achieve the temperature requirement for CSTR vessel.

the temperature requirement is for the process or for the wall?

the heat transfer in this case is transient and there is a certain time for heating the system.

In both cases you know the imposed heat flux density of the MI Heater, thus the rate of heat transfer is q= heat flux density (W/m2)*Area of heating.

otherwise using one dimensional heat conduction in the thickness of the vessel and knowing the heat transfer coefficient of the process (due to the agitator) you can write the heat diffusion equation in the wall of the vessel with two boundary conditions: on one side you have heat flux of MI heater, on the other side you have convection with constant heat transfer coefficient and variable process temperature. the equation is d2T/dx2 =(1/alpha)dT/dt. the problem is a little bit complicated and you need a software (CFD) in order to have accurate results.

another way is determine the residence time (I think you have access to it) and to consider that during this time the process is heated from the initial temperature to the required temperature. Thus you can obtain the average heat flux density that should be provided: q = m.c.delta_T/residence time or q = m.delta_enthalpy/residence time.

the heat flux density of the MI heater is q'' = q/Area of heating.

this method is not very accurate and it is very simplified. it is just a rough estimation of the heat flux density.

please correct any misunderstood information so we can help you more.

Kind regards,

Kifah SARRAF

“Forgiveness takes intelligence, discipline, imagination, and persistence, as well as a special psychological strength, something athletes call mental toughness and warriors call courage.” ~ E. M. Hallowell

Thank you Kifaf for your in-detailed reply. It was very helpful.

Fateh, Thank you for an inspiring quote.