I am trying to simulate the deposition of Silicon over SiO2. In reality, when we try to deposit a crystalline Silicon over SiO2 (amorphous), we get rather a polycrystalline Silicon. In ATHENA though, when simulating the same process, the final deposited Silicon layer is not Polycrystalline Silicon but Crystalline silicon.

So, If someone can help me know how to capture this effect in Silicon and how to measure the quality of the deposited film in the Silvaco ATHENA TCAD tool, it would be really helpful.

If the proper simulation is not possible in ATHENA, please let me know which tool can capture these effects properly.

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