Right now I'm investigating thin NiOx deposited by hollow cathode gas flow sputtering. To accuratly check for the influence of p(O2) on lattice parameters i decided to work with TOPAS (Bruker).

The films are 80 nm NiO on Corning Eagle XG.

My measurements are carry out on a Bruker D8 Discover with cupper-cathode in GID geometry at incident angle of 1°: goniometer radius=430mm, PSD-window=1.9119°. On primary side a Göbel-Mirror and a 0,2 mm Slit are mounted on the secondary side only a parallel plate collimator (Equa. Soller 0.4°).

My question now: How does my emssion line profile must look? (since I use a goeble mirror it cuts kB, and parts of ka2 and also distorts with angle) I could find accurate values, or suggestions on this.

And how to simulate the fixed Omega (incident angle)? I do not use zero-correction or hight offset, since I'm in GID.

2 Phases is accurate i guess: one for SiO2 (Substrate) and one for my film. The Cubic lattice is not able to recreate all peak positions. Therefore I use rhom. NiO (ICDD 00-044-1159)

Please have a look on the attched files.

Thanks in advance!

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