You may expect a 3 nm surface SiOx layer at most (in any normal environment) due to self limiting Oxygen migration across the native layer itself agin at normal conditions of course)
Naturally this depends on temperature and stress conditions. Further mechanistic details regarding the self-limiting oxidation process, which results in a particular temperature and geometry governed oxide layer thickness are presented in a study attached here.
Article Two-dimensional modeling of the self-limiting oxidation in s...