What are the key elements developing the property of hardness in materials synthesized by the different compositions of solid and gaseous atoms?
(Please check the link of article https://doi.org/10.1080/2374068X.2020.1822055 to get some feedback about this question.)
Hardness or softness of the material is totally determineded by the type of bonding and local crystal structure of the material
In case of thin films there are many parameters in which thickness and deposition technique used itself is very important. Some cases if you use the presence of inert gas then it affect the atomic bonding due to the adhesive energy of the atoms used in deposition. Also the post annealing is very crucial as it might destroy the film by thermal stress and you can see cracks or island type structure. At the last but not the only, the used substrate and the substrate temperature at the time of deposition is also important. So there are many factors, and you have to minimize the problem one by one without affecting the application performance of the thin film.
Thank you for writing about the influence of various parameters on the hardness of deposited thin films. As I given the link of recently published article in "Advances in Materials and Processing Technologies". The paper discussed the underlying mechanism of developing hard features in TiN coating and I would appreciate to comment in the light of presented discussion in that article. If there is any difficulty in downloading the paper from journal, you may download the previous version (preprint) of that paper from the following link; Preprint Hard Coating Deposits: Incompatible Working Energy and Force...
For the article titled “Qualitative Analyses of Thin Film-Based Materials Validating New Structures of Atoms” if the link http://dx.doi.org/10.13140/RG.2.2.27720.65287 is not working, please check the link https://www.researchgate.net/publication/352830671 as it is working. Sorry for the inconvenience and thank you.
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