I want to synthesize thin films on glass substrate and in order to do so I need to increase the wettability of my substrate. Apart from RCA cleaning and plasma treatment is there any other way to increase the wettability of the glass substrate?
A simple strategy to modify the chemical composition of glasses, SiO2-based, its based on HF treatment. You can try expose your samples at HF vapor (This procedure beyond simples is danger, attention!).
You can form a little amount of HF using the reaction between H2SO4 and KF.
A small stoichiometric amount is enough to evolve a sufficient amount of gas to increase glass wettability. You should do this procedure with gloves and goggles, in a chapel under an exhaust fan. Wettability can be measured by advancing the contact angle of the surface and water.
See this:
Can anyone suggest a method to vary the wettability of the substrate?