We are depositing hydrogenated DLC by using Plasma Enhanced Chemical Vapor Deposition using methane and hydrogen (as precursor gases) along with argon (as plasma gas). The system is equipped with RF power supply and an automatic matching network. The system performs normally before the introduction of precursor gases in argon plasma with no reflective power. However when we introduce both precursor gases. We are getting 90% reflective power. We tried automatic mode but it didn't work. We have two parameters to play with.
1: Tune,
2: Load
Any suggestion will be appreciated.
Regards.
Tuning through stub tuner may reduce the issue, also if metallic substrate is used, that may be a cause of reflective power. I hope your substrate holding platform is fixed and grounded. If you observe a charge cloud in the vicinity of the substrate (which could also be a reason of reflected power), you may bias the substrate holder accordingly.
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