During a Cs diffusion experiment, I deposited a Ti layer which acts as a hard mask on RbTiOPO4 substrate, but now properties of Ti have changed and Cs is also diffused into it. And it's not possible to remove it with normal method. Is there any chemical which can remove that layer without affecting the substrate?
Thanks alot for your replies,
Armando Loni: The thing is that I have tried HF and its higly reactive, it removes the layer but also reacts with the substrate and etch it. So its highly not recommended.
Hatem Maraqah, as I mentioned before its not Ti anymore, it is converted into some oxides or some other compound, otherwise we were remvoing it normally with H2O2: NH4OH. I have also tried base like NaOH but nothing works. Now we are waiting for XRD analysis, then we will be able to know about the nature of compound.
I think from the results of X-ray Diffraction analysis you can get a lot of information
It would help to know the conditions for the Cs diffusion - was this in aqueous solution, or a molten salt? Temperature? This could help to deduce the form of Ti on the surface and then perhaps a method to remove it.
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