I am trying to etch Si with DRIE tool. I should etch it only for less than 700nm. I also need to have have rough surface. Any recommendations to increase the surface roughness?
What level of roughness are you looking to achieve?
Is it just the sidewalls that need to be rough, or the floor too?
Jules Lloyd Hammond the floor should be rough. in a way that the color contrast between etched parts and Si surface is visible. i think the roughness more than 50nm is sufficient.
You can use a metal mask for the etching to get some redeposition of the mask material at the etch floor that will lead to roughening. You can even get so called black silicon in this way (Si that is soo rough that it reflect very little light compared to what is absorbed).
Good luck!
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