As per cleaning purpose acetone and methanol or ipa usually used.. SiO2/Si substrate is cleaned with firstly under acetone and then put in methanol quickly before it dry after taking out from acetone. the dust and other grain particles which causes defects in your sample can be removed by precleaning your samples. its just a precautionary technique for your sample to not have dust particles. 

Dear colleague Morgane Merle

Have a nice time and good day

the attached file contains a program for substrate cleaning and Cu etching. The left side

is for Cu etching, the middle and right side are considered for substrate cleaning.  

I wish that help you and be useful.

yours

A. EL-Denglawey

Using Di water -acetone- methanol -Di water. I ensure your sample clean and no other grain which affect the sample`s structure. I agree with Ghazanfar. 

Hello, Morgane!

Acetone is sort of good solvent for dissolving grease, paint, or any organic particles. you know it is used for nail polish remover. Most researchers use Acetone since it has some advantages such as low toxicity, low price, water-solubility. The following Alcohol cleaning process is just for removing the Acetone solvent which is containing organic particles in it. So it is important for the substrate to be immersed into alcohol quickly before Acetone is evaporated. Otherwise, the organic impurities contained in the Acetone solvent would stick on the substrate. Once stuck, they are hardly pulled out.

@Ghazanfar Nazir

Can we follow the same procedure for cleaning the platinized silicon wafer? If I use ultrasonic cleaning, how long should I put the wafer in Acetone, IPA and distilled water? Do I need to do it in hot bath?