Hello,
I am trying to synthesize hollow polypyrrole nano rods by using ZnO nanorod array template-assisted route. During ZnO etching process in order to remove ZnO from PPy/ZnO nanorod structure, I observed that polypyrrole also peelled off from the substrate. (I am using 5 mM HCl solution to etch ZnO for overnight). There are several articles in the literature but they don't mention anything about this problem. My question is that is etching time an important parameter? In the literature they generally prefer to use shorter etching time such as 8 hours. Or do you have any suggestion about this problem?
Thank You
I'd consider an etching time of 8 hours as ridiculously long and will lead to unwanted effects. I have never heard of anything this long in all my life! The longest etching times I used to use in the industry were of the order of 3 minutes.... I was using warm (50 C) 50% HCl (8 M, if I recall correctly)....
@ Charif I agree that you need to reduce the amount of identical answers. RG seems to have a problem at present with this and I've reported it to their Help Desk. You can eliminate unwanted duplicate answers by using the arrow key at the top right of the posting. This applies to editing too.
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