Etching graphene on SU8 coated substrate

03 July 2017 1 2K Report

Hello!

I want to pattern graphene on SU8 coated substrate. I have transferred LPCVD grown graphene using wet transfer onto SU8 coated Si wafer. I have protected the pattern using a photoresist (Shipley). I am looking for conditions to etch graphene without affecting the underlying SU8. Can anyone suggest a method and conditions for the same, preferably using RIE plasma therm etch or UV-ozone? Thanks!

Jules Lloyd Hammond

Hello Sahil,

Do you have any more information of the layer thicknesses, feature dimensions and your desired final structure? Oxygen plasma seems to be one of the most popular method for graphene etching, however you will have to optimise the conditions and duration to make sure you do not start etching too much of the underlying SU-8.

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