EIS/ not stable OCP/Tafel corrosion?

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Jules Lloyd Hammond

Hello Logesh Shanmugam ,

You ask if it is still OK to run EIS when the OCP has not stabilised, but you give no values for the instability of the OCP! For instance, it could be fluctuating by a few hundred microvolts, or tens of millivolts. Furthermore, what is the measured OCP? What fraction of the OCP is the fluctuation?

How are you connecting the sample to the measuring device? OCP fluctations can be commonly caused by poor quality connections and/or cables.

Moving on, can you provide further details of the rest of your electrochemical cell?

Can you test your mesaurement device with a "dummy cell" to remove this as a possible cause?

Jules

Cornel Radu

A thin and well ordered TiO2 layer is naturally developed on the pristine alloy. It has a high resistance to corrosion. It may be not the case for the plasma treated samples.

Use a shorter frequency range for EIS : 100 kHz...1 Hz ( to limit the recording time and the effect of OCP variation).

Logesh Shanmugam

Dear Jules Lloyd Hammond

Measured OCP for MAO treated sample shows around (-0.2v) with flucntiom of 50mv. However for pristine Ti alloy shows postive OCP (0.01). Does it mean the plasma treated sampel shows poor corrosion comapree to Ti alloy. On the otherhand, thickness of Oxide layer is about 10microns. I am bit confused

Dear Cornel Radu,

Thanks for your answer. So, plasma treated sample shows poor corrosioj eventhough the oxide thickness is about 10microns for plasma treated Ti alloy