When vacuum annealing of the film is carried out then what are the residual gases present in furnace and how it affects the physical properties of thin film.
Actually not, if you use electron beam annealing , there will be no gas formation. But some thermal annealing may cause gas formation depending upon the material you use for annealing.
The residual gas released from your thin films during the annealing films in a vacuum oven, very much depends what materials you used to make your films. If your films are liquid processed or thermal processed films, the residual gas are very different. The moisture could present for both cases.
The residual gas released from your thin films during the annealing films in a vacuum oven, depends, mainly, on 'how high is' the (annealing) Temperature and time, the films' porosity, and contamination, etc. for the material(s) under annealing.
Many materials must undergo heat treatment in order to achieve the desired technological properties. Heat treatment in air can damage materials by reactions with atmospheric gases, or the appearance can be affected and expensive subsequent treatment is necessary. With heat treatment in an inert gas atmosphere or in technical vacuums (low pressures), these reactions will be restricted or eliminated.
Noble gases of high purity as an inert protective atmosphere still contain contaminations of other reactive gases. A high vacuum of 1 × 10-3 mbar is already 10 times purer as a 5.0 purity level technical gas. The heat treatment in vacuum provides the cleanest alternative in preventing surface reactions. However, a gas must be employed temporarily to accelerate the cooling-down process, but reactions of annealing batches treated in this manner will be reduced to a minimum.