The peak current densitiy of HiPIMS is usually 0.5~2.0 A/cm2, nearly equal to that of the cathodic arc evaporation. The duty of the HiPIMS is always less than 10%. However, the deposition rate of the HiPIMS films is close to ARC film, several μm per hour, they didn't show a more than tenfold of difference. Why?