Hello all,
I have been using a vapor deposition method (electron beam evaporation) to deposit a 10nm layer of Ti and a second layer of either Ag or Au at 250nm, on a sheet of ITO. They have great resolution after the deposition but upon gentle cleaning with 70 EtOH on a kim wipe, the top Au/Ag layer completely delaminates leaving the Ti layer intact.
Can anyone suggest why this is happening and a potential solution?
Best,
Dear Craig,
It is due to the oxidation in the interlayer. it comes from poor vacuum. Or, selection of the adhesion layer. you can use Cr,W,Ni as a adhesion layer depending to your thin-film. Cr will works well as removing oxygen by reacting with it and good adhesion to your film.
But, first take care of your vacuum that should be below the e-4 Pa
I have sputtered TiW as an adhesion layer for Au in the past, but I'm a bit unsure if E-beam evaporation will properly create a homogeneous TiW layer.
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