I have successfully released MEMS cantilevers with a photoresist sacrificial layer, using a dry plasma ashing technique. However, this process tends to damage the metal contact pads and result in curved beams. To rectify this issue, I have attempted to perform a wet release process with critical point drying. The die is placed in a remover PG bath (heated 90C, for 3 hours). Then it is placed in IPA and followed by critical point drying. When the process is done, all the cantilevers on the die are cracked at the anchor point and no photoresist is removed.
What can be the possible reason for the cracking?
appreciate any responses.