I deposited TiO2 thin film on Si substrate from a TiO2 oxide target using rf magnetron sputtering technique (only Ar plasma is used ). Can i expect individual Ti and O2 atoms are sputtered from the target ?
You will get mostly Ti and O atoms (very few O2 molecules), but also small clusters; you could speak of molecules since a cluster should involve metal-metal bonds, but since people mostly sputter metals, the term is sort of transferred there, so don't get confused when diggind through literature. The cluster size distribution can actually be regulated by the sputtering conditions; if you sputter clusters, the resulting film will probably not that smooth.
On the other hand, if you actually want large clusters, that can be maximized by sputtering into a "cold gas" atmosphere in which the clusters can agglomerate to larger sizes. The group of Bernd von Issendorff here in Freiburg is quite well-known for building sources tailored for this purpose.
Yes, it is possible to get individual Ti and O2 atoms or TiOx molecules from sputtered TiO2 target.
When sputtering you are getting a spectrum of small TiOx clusters, Ti atoms and ions, O atoms/radicals but unlikely any measurable amounts of O2 molecules.
I recommend you dig through the publications by Bernd von Issendorff:
https://cluster.physik.uni-freiburg.de/publications_articles/
He is known for constructing cluster sources tailor-made for the formation of larger clusters. TiO2 may not be the main focus, but you will find general mechanistically relevant works, I would assume.
This is an example where you generate a range of boron oxide clusters from simultaneously from a single oxide target - using mass spectroscopy to evaluate the distribution and mass filters to select any species for experiments.
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