I am trying to find an optimal etch conditions of SiO2. So, I take a microscope slide and do the lithography to create a step height of 300 nm by depositing 150 nm gold and 150 nm SiO2. Then when I try to see it in Profilometer, it shows a lot higher value than 300 nm. So, is it becuase of the roughness microscope slide or there is something else responsible for it? Thanks.
Microscope slides are comparatively rough, but still you should be able to differentiate steps of 300 nm. I will recommend you to choose microscope cover slips for your experiments (if suitable), which are quite flat (roughness around 1-2 nm).
If you observe step height a lot higher than 300 nm, you need to cross check the calibration of material depositing instrument for thickness measurement and of Profilometer.
Is there any way to improve the surface roughness on microscopic glass slides?. I want to use it for milling but before I want to improve the surface roughness of glass slide.
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