Hi, I wanted to use a glass mold with pattern for making devices with PDMS. So, to make the PDMS come off the glass surface easily I want to surface coat it with OTS by vapor deposition. I cannot find a protocol to do so. Can someone share their protocol? Thanks in advance.
Dear Sourav,
After cleaning and UVO treatment you can put your glass substrates together with a few droplets of OTS in a vacuum oven at 100 degrees for 1 hour. In my case, I put my substrates into a crystallization dish together with 3 droplets of OTS in a 4 ml vial and after partially cover the dish with aluminum foil I just put it in a vacuum oven at 100 degrees for 1 hr. Good luck!
Vapor phase deposition of octadecyltrichlorosilane is generally not preferred. While it can be done, condensed phase of sol'n deposition is preferred. Generally shorter silanes such as octyl or isobutylene are preferred. See the attached document p19-20 which gives a variety of techniques.
Hi,
You might want to check the protocol from André Estévez-Torres, Ayako Yamada and Li Wang provided here https://blogs.rsc.org/chipsandtips/2015/11/20/precise-microchannel-fabrication-and-alignment-with-rapid-prototyped-apparatus/ .
2. Under a chemical fume hood, one drop of tri-chloro-silane is placed on a microscope slide, which is in turn placed in a small vacuum chamber. The silicon wafer with SU-8 microchannel patterns is placed inside alongside the microscope slide. The chamber is closed and pumped down. After pumping down for 5 minutes to -0.8 atm of relative vacuum, the chamber is left for 2 hours for silane deposition on the silicon surface. Silane formation is visually checked after the prescribed duration as shown in Fig. 1(a).
Jasper
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