Can anybody suggest any chemical or solvent to remove resist residuals from graphene during photolithography?

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Peter Foldesy

Dear Abhay,

I dont know solvent solution, but a way is Ar/H2 400C cleaning baking, if available. You can find a good description in arxiv.org/pdf/0811.3091‎

Bests

Peter

Abhay A. Sagade

Thanks. Yes, obvious but we don't want to exceed the temperature of 180C for any fabrication step. I know there are many solutions are available even to project graphene before doing any lithography, but it involves additional processing steps.

I see. By the way, have you consider photoconductive THz microprobe with graphene photoconductor? We try to go on with this, unless strongly unadvised.