Hi ,

I am establishing CVD set up for lateral heterostructure of 2D materials (especially MoS2/WS2) using two zone furnace. I would like to know the parameter need to take care while geting high crystalline monolayer 2D film. I am concern with the parameters like gas flow, pressure, temperature and so on.

How much one should create pressure and temperature with gas flow in the quartz tube after creating vacuum. As I read in many papers,they just mentioned to heat it at particular temperature and just growth period is mentioned. But it is not clearly mentioned that how much pressure one should maintain and also vacuum conditions,

heating rate/ramping time to reach the desired temperature.

Please any one suggest/share your ideas for CVD setup as well as the parameters especially pressure need to consider while making highly crystalline monolayer of 2D TMDCs..

Thanks in advance

With regards,

Deepa