I deposited 70 nm of Ti onto SiO2 substrate, then 1000 nm of TiO2 on the Ti layer[at RT]. What temperature and annealing time should I use for the annealing step to achieve complete homogenization between the layers? The vacuum is ~ E-6 Torr
Dear colleague Mikhail Pylnev,
Have a nice time and good day.
Herein fined a review TiO2 article may be useful and help you.
Yours
A. El-Denglawey
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