I am trying to coat photoresist (PR) on top of a teflon coated silicon wafer. The stacking will be Si, amorphous teflon coating (by spin coat), photoresist. The problem that I am facing is that the hydrophobicity of teflon PR(AZ5214) does not adhere to it even after spin coating. There might be a way to stick this PR on teflon by adding surfactant. But there might be a chance of reduction of photopolymerization kinetics of PR. If any standard PR is available to coat on teflon so that it adheres to the substrate after spin coating, please let me know.
Hatem Maraqah
Try to add A cation surfactant and anion surfactant and watch the result and then if it does not work try to use amphoteric surfactant and let me know what happened
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