I am performing an all-atom molecular dynamic simulation in LAMMPS to perform the diffusion and adsorption capacities of gaseous hydrogen in metal alloys. For the simulation, I am using an embedded atom potential to model the interaction between the metal elements and a Lennard-Jones potential to model the H-H and H-metal elements interactions. All the lennard jones interactions follow the Lorentz-Berthelot mixing rules. I have used 0 as both the epsilon and sigma for the H-H interactions and by doing that all the other epsilons between the H-metal element are automatically going down to 0 (as the mixing rule for epsilon follows the geometric mean).

I am concerned about whether I am doing it right by using 0 LJ parameters for the H-H interaction. I have found some literature to support this for the adsorption but not for the case of diffusion analysis. It will be highly appreciated if anyone can give me some thoughts/advice on this.

pair_coeff * * eam/alloy 12_eam.alloy Al Cu NULL

pair_coeff 2 3 lj/cut/coul/cut 0 1.344

pair_coeff 1 3 lj/cut/coul/cut 0 1.1597

pair_coeff 3 3 lj/cut/coul/cut 0 0

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