Please help me to explain this, why usually two nickel precursors (NiSO4 and NiCl2) are used in the bath solution of Ni coating on steel substrate, what’s the reason ?...Thank you very much.
Which paper are you citing for Ni deposition using these two precursors? Pl go through and share your understanding.
There are many papers mentioning only one precursor for the same purpose. In some cases, light-induced depositions were also carried out. I think such two kinds of precursors might be useful to obtain any specific morphological or oriented Ni film.
The Ni bath containing NiSO4 and NiCl2 + H3BO3 is a common standard and is called Watt-Electrolyte. The main content is NiSO4, the NiCl2 improves the anode solubility due to the chloride content. A further improvement to the Watt-Electrolyte is the Nickelsulfamate. It contains more Nickel and is easer to handle.
The chlorine from the NiCl2 prevents pitting of the electrodes, but is a minor addition to the sulfate, (or sulfamate). I agree with Christian - the sulfamate works "better" - it results in less stress.